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2-34.Chemical Mechanical Polishing

2.Definition of Dimensional Properties,Terminology and Methods of Silicon Carbide Wafer

2-34.Chemical Mechanical Polishing

2018-01-08

Chemical Mechanical Polishing/Planarization is short as CMP, a process of smoothing surfaces with the combination of chemical and mechanical forces. It can be thought of as a hybrid of chemical etching and free abrasive polishing.

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